Protecting the EBE coatings from vacuum-air-shift by ion assistance or ALD capping layer

Abstract

Vacuum-air-shift causes trouble to conventional electron beam evaporation (EBE) coatings. This study compares the protection effect of ion assistance and the ALD (atomic layer deposition) Al 2 O 3 capping layer. The vacuum-air-shift was reproduced on an EBE Ta 2 O 5 single-layer film, a Ta 2 O 5 /SiO 2 double-layer coating, and a high-reflectance mirror. Similar samples were prepared by EBE assisted with ion beam bombardment. Part of the as-deposited coatings were capped by ALD Al 2 O 3 film with a thickness of about 100 nm. The vacuum-air-shift of the samples was tested with an in-situ spectrophotometer. The cross-section of the coatings was imaged by a scanning electron microscope. The ion assistance was found to reduce the vacuum-air-shift to a limit extent, while the ALD capping film was found to eliminate the vacuum-air-shift. The mechanism of the two protection techniques was analyzed, and their usage was compared and discussed. The ALD capping technique may be used in high precision EBE coatings with convenience and low cost.