Abstract
Abstract The demands of the National Technology Roadmap for Semiconductors will necessitate measurement of dopant concentrations with greater spatial resolution than now possible. Current experimental and simulation experience indicate that Annular Dark Field (ADF) imaging in a Scanning Transmission Electron Microscope (STEM) should be able to determine dopant distributions with near atomic resolution. The ADF signal is derived from electrons diffusely scattered to high angles, resulting in contrast due to atomic number (Z-contrast) and defects in the crystal lattice. Thus, heavy atoms can be imaged by their Z-contrast and small atoms by the misfit strain induced in the silicon lattice. Atomic number scattering is proportional to Zn where n is between 1.5 and 1.9 depending upon the inner detector angle of the ADF detector.
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