Prospects for development of the projection X-ray photolithographic technology

Abstract

Practical prospects for the implementation of the projection X-ray photolithographic technology in the wavelength interval 3–30 nm based on a combination of the CO2-laser plasma and multilayer X-ray reflectors is analyzed. It is demonstrated that the stable work of the CO2 laser with a power of several tens of kilowatts necessitates the application of a cooled polycrystalline diamond window between the active medium and atmosphere. Practical recommendations for the construction of the high-reflection coatings for the soft X-ray radiation based on the extension of the set of material layers are proposed.