Prospects for creating a laser nanolithography system for tasks of diffractive optics and nanophotonics

Abstract

This paper considers the basic concepts of constructing an advanced direct laser writing nanolithographic system dedicated to a high-resolution synthesis of large-sized planar elements of diffractive optics and nanophotonics. The issues of the rational implementation of optical, mechanical and electronic units of the system are solved together with considering the functional structure for a precise computer control of the mentioned units. The proposed design of the opto-mechanical unit aims to reduce significantly the distortions of fabrication of the optical elements due to the use of a new symmetrical two-channel construction and a differential laser interferometer for the radial positioning of a focused laser beam. A complex of issues on constructing a long-working distance superresolving focusing system are also considered alongside. The complex modernization of the nanolithographic system software and hardware complex based on system-on-chip (SoC) using hybrid processors (FPGA+ARM) is considered, which will make the system more universal and portable to various IT platforms.