Abstract

AbstractTo handle the drastic increase in communication capacity, the need for large‐scale, high‐speed switching systems is expected. As a solution, we proposed a 3‐Dimensional Micro Optical Switching System (3D‐MOSS) that arranges many thin‐film micro optical switches in multiple layers and connects them with Optical Z‐Connections. This implementation requires a micro optical switch having fast, stable operation. In this paper, we propose a waveguide‐prism‐deflector type micro optical switch (WPD‐MOS) as a candidate 3D‐MOSS thin‐film micro optical switch and analyze its operation. This optical switch forms a prism electrode in a slab waveguide having the electro‐optical effect. The application of voltage produces a dynamic waveguide prism and deflects the optical beam. A feature is the insensitivity of the processing precision to strong temperature fluctuations. An evaluation by the Beam Propagation Method (BPM) demonstrated the ability to implement 2 × 2 micro optical switches having a length of 390 µm, crosstalk ≤ − 12 dB, and insertion losses ≤ 0.96 dB at the drive voltage of 110 V. We also studied a 3 × 3 WPD‐MOS. © 2003 Wiley Periodicals, Inc. Electron Comm Jpn Pt 2, 86(8): 38–48, 2003; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/ecjb.10132

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