Abstract
ZnSe thin films with thickness of 30 nm and 50 nm were prepared on Corning 7059 glass substrates at room temperature by applying periodically interrupted physical vapour deposition of ZnSe and various deposition rates. All as-deposited films were annealed at 200°C and some of them were further annealed at 400°C. Results from spectroscopic ellipsometry have shown that the porosity of the films which is important for the ethanol sensitivity decreases with increasing deposition rate and annealing temperature. The porosity changes caused by annealing of the films at 400°C are accompanied with thickness decrease.
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