Abstract
The pulsed vacuum arc discharge (pulsed arc) is the most efficient PVD-technology for the deposition of super-hard carbon films on tools and machinery parts. Using the pulsed arc discharge a stable evaporation process of carbon and an efficient deposition of hydrogen-free ta-C type films is possible. In this paper, important properties of such ta-C films and their process conditions are explained. The films were characterized by hardness measurements using nanoindentation, friction and wear properties using oscillating sliding tests, and structural analysis using Raman spectroscopy.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
