Abstract
(Nb 1 − xTa x) 2O 5 solid solution films and (Nb 1 − xTa x) 2O 5-ZrO 2 nanolaminates have been deposited by Atomic Layer Epitaxy. Amorphous (Nb 1 − xTa x) 2O 5 films were obtained by sequential pulsing of tantalum and niobium ethoxide and water. The composition of the films was checked by Energy Dispersive X-ray Spectroscopy. (Nb 1 − xTa x) 2O 5 films exhibited 1.6–4 times higher permittivity than that of Ta 2O 5 films. Leakage currents through the (Nb 1 − xTa x) 2O 5 films were reduced drastically by adding intermediate ZrO 2 layers with thickness of 5–10 nm i.e. by constructing nanolaminate structures. The ZrO 2 interlayers contained nanosize tetragonal ZrO 2 crystallites.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
