Properties of microplasmas excited by microwaves for VUV photon sources

Abstract

Microplasma sources typically take advantage of pd (pressure × size) scaling by increasing pressure to operate at dimensions as small as tens of microns. In many applications, low pressure operation is desirable, which makes miniaturization difficult. In this paper, the characteristics of low pressure microplasma sources excited by microwave power are discussed based on results from experimental and computational studies. The intended application is production of VUV radiation for chemical analysis, and so emphasis in this study is on the production of resonant excited states of rare gases and radiation transport. The systems of interest operate at a few to 10 Torr in Ar and He/Ar mixtures with cavity dimensions of hundreds of microns to 1 mm. Power deposition is a few watts which produces fractional ionization of about 0.1%. We found that production of VUV radiation from argon microplasmas at 104.8 nm and 106.7 nm saturates as a function of power deposition due to a quasi-equilibrium that is established between the electron temperature (that is not terribly sensitive to power deposition) and the population of the Ar(4s) manifold.