Abstract
TiN coatings were grown in a commercial BAI 710 K deposition plant at substrate temperatures as low as 553 K. Films deposited at low temperatures reveal a dense, fine-grained microstructure over a wide range of deposition parameters. At low deposition rates the fimls are strongly (111) textured, however, as the deposition rate is increased, the preferred growth orientation changes towards (200). In addition, texture was found to depend on substrate bias. Macroscopically, the coatings are under compressive stress and measurements of both the Vickers and the Knoop hardness (as a function of load) strongly indicate that the films are at least as hard as those grown at higher temperatures. Results of preliminary tool life tests are also reported.
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