Abstract
Hydrogenated amorphous silicon carbide (a-SiC x :H) thin films were prepared by plasma-enhanced chemical vapor deposition using mixtures of silane (SiH 4 and a systematic series of hydrocarbon gases. It is found that, at fixed molar gas ratios, the chemical nature of the hydrocarbon gas profoundly affects the composition of the film. The same film composition can often be obtained by admixing different hydrocarbon gases with silane at different ratios. Material properties such as optical band gap, refractive index, and mechanical abrasion resistance are found to depend on the elemental film composition, rather than on the composition of the precursor gas mixture.
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