Abstract
Increased interest in ion conducting thin films and thin-film devices is evidenced by the number of papers on this topic presented at the recent Garmisch conference [1[. Magnetically enhanced (magnetron) sputtering [2,3] is an important technique for depositing these as well as other kinds of ceramic thin films. Two advantages of magnetron over conventional diode sputtering are the increased sputtering rate, which is important in the deposition of ceramic materials, and the reduction in electron bombardment of the substrate and growing film. In this paper, we describe our high-vacuum film growth chamber and present the results of tests of this system in fabricating films of lithium ion conducting glass electrolytes, TiS2, and vanadium oxide by reactive dc and rf magnetron sputtering. The results of combining these films into a thin film lithium battery also are discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
