Abstract

A collisional magnetized plasma sheath with two groups of electrons has been studied using a fluid model including the effects of the ionization source term and the collisional force between ions and neutral atoms. Two kinds of non-Maxwellian descriptions of electron velocity distribution, non-extensive distribution and truncated distribution, are applied in the model, and the ionization effects of both kinds are considered. By applying Sagdeev potential, the modified Bohm sheath criterion is derived. The effects of ionization, magnetic field, and high-temperature electron concentration ratio on plasma sheath density, potential, sheath thickness, and ion kinetic energy are studied. In cases with high background gas density, ion density accumulates at the sheath edge position, forming a peak and manifesting as a rapid drop in the potential profile. The distribution characteristics of electrons have a significant impact on the transport properties of ions. Oscillations and non-monotonic characteristics of net charge near the sheath edge occur as the magnetic field angle increases, leading to an increase in the sheath layer width. It can be seen that in the case of a collisional sheath structure with high-temperature electrons, it is essential to consider the sheath changes induced by the ionization and the collisional force. Compared to a symmetric electron velocity distribution, the actual thickness of the sheath layer in a truncated electron distribution assumption could be significantly reduced.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.