Abstract
The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrO x growth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrO x thin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO 1.9 and at the interface, O–Zr–Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.
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