Abstract
Silicon oxynitride films ( SiNx Oy ) were deposited using mercury-sensitized photochemical vapor deposition. The photochemical vapor deposition (photo-CVD) SiNx Oy film was used as an antireflective coating (ARC) for a single-crystal Si solar cell. It was found that the refractive index of SiNx Oy film deposited at low temperatures showed maked time dependence.
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