Abstract
A high-brightness photoemission source is being developed for use in a multiple-electron beam lithography system suitable for mask patterning. Cesium telluride (Cs2Te) photocathodes have achieved stable brightness of 2–3×106 A/cm2 Sr and current densities of 30–60 A/cm2. Magnesium photocathodes have achieved stable brightness of 1–3×106 A/cm2 Sr and current density of 40 A/cm2. Long term current stability of better than the required specification of 17%/5 min has been obtained at photoyields of ∼30 nA/mW.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
