Abstract
It is shown that using of the method of partial correlogram scanning and the atomically-smooth surface as interferometer reference mirror allow to improve the longitudinal resolution of profile measurement up to 30 picometers and to decrease the systematic error caused by the optical aberrations more than an order. The results of measurement of silicon (111) surface containing monatomic steps 0.314 nm in height with longitudinal resolution 30 picometers are presented.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
