Abstract
The power of transition radiation (TR), emitted from our storage ring synchrotron (SRS) MIRRORCLE‐20SX, for performing X‐ray lithography (XRL), and EUV lithography (EUVL) is calculated. Results are presented for a variety of elemental one‐foil TR emitting targets, as well as for multi‐foil non‐coherent TR targets, and multi‐foil coherent TR targets. One foil targets with optimum thickness for XRL were prepared by Al, collodion, and C foils.
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