Abstract
A model for chemical vapor infiltration is analyzed. Consider a cylindrical pore with a reacting and carrier gas flowing in from the left. The gas reacts with the interior of the pore and the result is a solid matrix. The model assumes that the flux due to binary diffusion is negligible. The model also assumes that the reactions are first order. A process is successful if the void remaining in the preform is less than some tolerance. The results yield the profile of an unsuccessful process and the criteria for a successful process.
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