Abstract
Wafer thinning represents a critical step in 2.5D and 3D-IC integration. Achieving low total thickness variation (TTV) of a bonded stack is essential since it directly impacts the TTV of the thinned device wafer. It is essential to understand and utilize appropriate processes and materials that provide precision bonded stacks prior to thinning operations in order to achieve high process yields. The 3M™ Wafer Support System and Corning's precision glass carrier wafers were used to produce bonded stacks. Leveraging metrology tools like the Flatmaster MSP-300 and low coherence interferometric probes allow for characterization of the TTV of each layer of a bonded stack and better understanding of the stack-up as well as how to minimize stack TTV. The ability to deliver stack TTV of < 2 um in a repeatable manner has been demonstrated.
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