Abstract
In this paper, the development of sputtering technique for the production of new ternary Ti-Mg-Si light alloys is discussed. Structural characterisation of the ‘as-deposited’ samples and ‘heat treated’ ternary alloy thin films has been completed. The as-deposited films are structurally metastable, and are consisted of fined-grained solid solutions with enlarged solubility limits. Annealing of the asdeposited ternary samples resulted in the decomposition of the thin film solid solutions to form different Ti-Si intermetallic compounds.
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