Production of silicon coatings by plasma-arc method

Abstract

Silicon coatings consisting of micro and nanopores were obtained by plasma-arc method. An experimental setup was assembled for the synthesis of nanostructures. A number of experiments on the synthesis of silicon nanostructures with changes in parameters such as current, voltage, and pressure in a vacuum chamber were carried out. In the experiments, a molybdenum cathode was used as a substrate for the deposition of silicon nanostructures. Atomic silicon evaporated from the anode. The experiments were carried out in an argon medium at a pressure of about 500 Torus. The current in the experiments is about 8 A, and the voltage is within 80 V. The resulting coatings with silicon nanostructures will increase the active surface area by several tens of times.