Abstract
High-resolution carbon micro-patterns have been produced by SU-8 negative photoresist photolithography process in order to obtain substrates with controlled morphology. Subsequently, substrates were subjected to pyrolysis treatment to obtain glassy carbon structures. iPSCs-derived Neural Stem Cells (NSCs) were cultured on the substrates to analyze the effect of the pattern on their morphology. Preliminary results show that the cells recognized the pattern and started to modify their orientation according to the imposed configuration. Moreover, cells developed cytoskeletal protrusions selectively in relation to the designed features of the substrate. Finally, NSCs seeded on parallel channels tend to communicate through the sidewalls.
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