Abstract
Cluster beam evaporation has been used to produce metallic and semiconductor thin films for microelectronic applications. Previous work showed that the deposition of large clusters of antimony (>Sb 2000) onto silicon substrates and carbon films can be performed by thermal evaporation through a nozzle orifice and has been modelled using molecular diffusion theory. The results here show that the model can be extended to include other metals (e.g., Ag). TEM shows that cluster sizes in the case of Ag are much smaller than for Sb, having a di-similar statistical spread. Photoluminescence of Mg, Sb and Ag films show decreasing PL intensity with temperature which correlates with the expected concentration of clusters.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
