Abstract

few layer graphene produced by an undemanding electrochemical delamination method has been presented here using potassium hydroxide. Copper strip is kept at zero potential and carbon rod is kept at positive or negative potential. The few layer graphene is characterized by XRD, FESEM, Raman and AFM. By employing KOH, larger dimension few layer graphene of 4.5nm thickness with are of $11\mu\mathbf{m}$ is obtained. Production of few layer graphene was confirmed by RAMAN. These graphene flakes are dissolved in dimethylformamide (DMF) to form a homogeneous solution. After drop casting, a skinny layer of graphene is obtained. After that, annealing is done at 250°C to eliminate some functional groups present.

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