Abstract
A recently discovered phenomenon of excessively high X-ray production is discussed. The high yield is attributed to the build-up of potential on non-conducting targets irradiated with accelerated ion beams, and the subsequent discharge. Ion-beams of1H+,1H2+,2H+,2H2+,3He+,3He2+,4He+,14N+,14N2+,16O+ and20Ne+ were used. A new mechanism of X-ray excitation is proposed. The increased X-ray fluxes produced by this process are suitable for analytical applications of high specificity. The mechanism of excitation associated with the process, factors affecting the high X-ray yields, applications and a general overview of the studies undertaken with the various ion beams are given.
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