Production of carbonized micro-patterns by photolithography and pyrolysis

Abstract

The preparation of carbon micro-patterns is reported in this paper. Different carbon micro-patterns were created using photolithography of the epoxy-based negative photoresist SU-8. Photoresist patterns were optimized in terms of resolution and aspect ratio and subsequently subjected to pyrolysis to obtain carbonized and conductive 3D structures. The latter step requires the optimization of the resist cross-linking time as well as the temperature and time of the resist post-bake. This step is crucial in order to avoid any severe modification of the geometry of the patterns produced during the actual pyrolysis. By observing optical and scanning electron microscope images, the morphology of the structures before and after pyrolysis was studied and the same patterns were also characterized by a laser probe profilometer. Finally, the thus obtained carbon patterns on Si wafers were used to carry out cell culture tests with Neural Stem Cells (NSC). The adhesion and the arrangement of the stem cells were analyzed to verify the ability of the patterned substrates to guide the orientation and, therefore, the differentiation of the cells.