Production of carbon films by the electric arc sputtering of graphite in a magnetic field

Abstract

The results of experimental investigation of the effect of a magnetic field on the structural-morphological features of carbon films deposited by the electric arc sputtering of graphite are presented. It is found that the action of a magnetic field on the plasma flux causes the formation of a practically smooth amorphous film. However, the magnetic field prevents the formation of graphitic nanoclusters (∼4 wt %) in the film, the presence of which is the cause of the field emission of electrons at a low threshold field strength of ∼7.5 V/μm.