Abstract

Electrodeposited Ni-P, Ni-W-P, Ni-P+W and Ni-P+NiO+W coatings were obtained in the galvanostatic conditions at the current density jdep = -200 mA cm-2. A stereoscopic microscope was used for surface characterization of the coatings. The phase composition of the coatings was determined using X-ray diffraction (XRD) method. The chemical composition of the deposits was determined using atomic absorption spectroscopy (AAS). It was found out that the introduction of the tungsten powder in one case, and the nickel oxide and tungsten powder in the other into the electrolytic Ni-P matrix results in obtaining the coatings with a very rough surface. The coatings obtained in this way may be useful while applying them as electrode materials in electrochemistry.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.