Abstract
The results of the study of epitaxial thin films of SrIrO3 are presented, data on growth technology, crystal structure and electronic transport are presented. In SrIrO3 films received in a mixture of Ar and O2 gases, the dependence of resistance on temperature has a metallic character. For the films deposited in pure argon, the resistance versus temperature curves shows both a metallic and a dielectric behavior. It depends on the deposition pressure and the deposition temperature. The activation energy was calculated for dielectric samples and compared with the activation energy for Sr2IrO4 films.
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