Abstract
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition of high critical temperature Tc superconductors. However, the fabrication of thin films of high Tc materials, especially YBa2Cu3O7-x, for superconducting applications is associated with problems in areas such as chemical and structural purity, stability, oxygen stoichiometry, and weak links. As a consequence, many deposition techniques have been applied to grow thin films. In this review, the critical processing parameters in the deposition of YBa2Cu3O7-x films by techniques such as sputtering, laser ablation, and metalorganic chemical vapour deposition are discussed. Another important aim is to examine the influence of microstructural features on the transport properties of these films. Finally, an application of thin films of YBa2Cu3O7-x is illustrated from the results available on controlled growth of a grain boundary Josephson junction.
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