Abstract
This paper presents the results of investigation of the propagation of plasma flow in a plasma arc installation for vacuum coating deposition. The distribution of plasma arc flow parameters in longitudinal and curvilinear magnetic fields is analysed. The dependence of the concentration of various atomic particles on the parameters of the vacuum arc plasma was investigated by emission spectroscopy techniques. It was found that in a vacuum arc jet the various elements comprising the cathode, and their isotopes, separate in the presence of a magnetic field. The concentration of atomic particles—the products of molecular dissociation—depends on the arc-penetrating current through the working chamber area. The plasma sheath created near the substrates under negative bias potential was investigated. The criteria for the placement of filters to capture droplets and their probabilistic efficiency were determined for various filter geometries. The results of the application of this process to coating deposition technology are discussed.
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