Process parameters optimization to maximize surface roughness using response surface methodology of TiC thin film grown by radio frequency magnetron sputtering

Abstract

Abstract This research study investigates the influence and interaction of magnetron sputtering process parameters on the surface roughness of Ti6Al4V alloys. Titanium carbide (TiC) thin films with 99.99% purity were deposited on Ti6Al4V substrates using Radio frequency (RF) Magnetron sputtering deposition process. The process parameters considered for the deposition processes were sputtering time, RF power and temperature. A central composite rotatable design (CCD) consisting of three sputtering independent process parameters, five levels and twenty experimental runs were used to minimize the number of experiments. The surface roughness of the coated samples was examined using a 3D optical profiler Contour Elite K microscope. Regression analysis and analysis of variance (ANOVA) were performed to determine the optimal process parameters and the adequacy of the model. An empirical relationship was developed to investigate the effect of the sputtering parameters on the surface roughness of the coated samples and predicting the surface roughness. The influence of these factors on the surface roughness of the thin-film coating is evaluated based on the empirical relationship developed. The findings revealed that RF power makes the most significant effect on surface roughness. The statistical analysis (Regression and ANOVA) indicates that the mathematical model is significant.