Probing Exciton Diffusion in Semiconductors Using Semiconductor‐Nanorod Quantum Structures

Abstract

SmallVolume 4, Issue 4 p. 467-470 Communication Probing Exciton Diffusion in Semiconductors Using Semiconductor-Nanorod Quantum Structures† Jinkyoung Yoo, Jinkyoung Yoo National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea)Search for more papers by this authorGyu-Chul Yi, Corresponding Author Gyu-Chul Yi [email protected] National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea) Gyu-Chul Yi, National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea). Le Si Dang, Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France).Search for more papers by this authorLe Si Dang, Corresponding Author Le Si Dang [email protected] Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France) Gyu-Chul Yi, National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea). Le Si Dang, Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France).Search for more papers by this author Jinkyoung Yoo, Jinkyoung Yoo National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea)Search for more papers by this authorGyu-Chul Yi, Corresponding Author Gyu-Chul Yi [email protected] National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea) Gyu-Chul Yi, National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea). Le Si Dang, Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France).Search for more papers by this authorLe Si Dang, Corresponding Author Le Si Dang [email protected] Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France) Gyu-Chul Yi, National CRI Center for Semiconductor Nanorods and Department of Materials Science and Engineering, POSTECH San 31, Hyojadong, Pohang 790784, (Korea). Le Si Dang, Institut Néel, CNRS and Université Joseph Fourier, Grenoble 38042, (France).Search for more papers by this author First published: 23 April 2008 https://doi.org/10.1002/smll.200701293Citations: 24 † We thank Dr. J.-D. Ganière at Ecole Polytechnique Fédérale de Lausanne for fruitful discussions. This study was financially supported by the National Creative Research Initiative Project (R16-2004-004-01001-0) of the Korea Science and Engineering Foundations (KOSEF), and partly supported by the Korea Foundation for International Co-operation of Science and Technology (KICOS) through a grant provided by the Korean Ministry of Science and Technology (MOST) in 2007 (No. M60605000007-06A500-00710). We acknowledge support by the Université Joseph Fourier and by the LIA CNRS-KIST Center for Photonics and Nanostructures. Université Joseph Fourier supported the 3-month stay of Prof. G.-C. Yi in Grenoble. We also thank POSTECH NANOFORUM for many discussions. Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinkedInRedditWechat Citing Literature Volume4, Issue4April 2008Pages 467-470 RelatedInformation