Abstract
Abstract Two-photon polymerization direct laser writing (TPP DLW) is an emerging technology for producing advanced functional devices with complex three-dimensional (3D) micro-structures. Tremendous efforts have been devoted to developing two-photon polymerizable photo-sensitive nanocomposites with tailored properties. Light-induced reconfigurable smart materials such as liquid crystalline elastomers (LCEs) are promising materials. However, due to the difficulties in designing two-photon polymerizable liquid crystal monomer (LCM) nanocomposite photoresists, it is challenging to fabricate true 3D LCE micro-structures. In this paper, we report the preparation of photo-sensitive LCE nanocomposites containing photothermal nanomaterials, including multiwalled carbon nanotubes, graphene oxide and gold nanorods (AuNRs), for TPP DLW. The printability of the LCE nanocomposites is assessed by the fidelity of the micro-structures under different laser writing conditions. DLW of GO/LCM photoresist has shown a vigorous bubble formation. This may be due to the excessive heat generation upon rapid energy absorption of 780 nm laser energy. Compared to pure LCM photoresists, AuNR/LCM photoresists have a lower laser intensity threshold and higher critical laser scanning speed, due to the high absorption of AuNRs at 780 nm, which enhanced the photo-sensitivity of the photoresist. Therefore, a shorter printing time can be achieved for the AuNR/LCM photoresist.
Highlights
In recent years, advanced functional devices with threedimensional (3D) micro-structures have attracted enormous attention due to the enhanced functional density, performance and efficiency [1]
Improvement of the stability of MWCNTs within the liquid crystal monomer (LCM) photoresist was accomplished by oxidizing the surface of the MWCNTs using a strong acid [28]
During the writing process of the graphene oxide (GO)/LCM photoresist, excessive energy absorption by GO has led to tremendous heat generation and vigorous bubble formation, which in turn hindered the formation of the 3D structure
Summary
In recent years, advanced functional devices with threedimensional (3D) micro-structures have attracted enormous attention due to the enhanced functional density, performance and efficiency [1]. TPP may offer an alternative way for 3D micro-/nano-fabrication, to the best of our knowledge, there has been only limited report on producing two-photon polymerizable photosensitive nanocomposites for producing LCE microstructures [24]. This may be due to the challenges including the design of TPP-compatible liquid crystal monomer (LCM) photoresist, as well as poor miscibility between the photothermal nanomaterials and the polymer photoresist matrix. We prepared three LCM-based photosensitive nanocomposites by addressing the aforementioned difficulties by using two-photon polymerization direct laser writing (TPP DLW). By harmonizing the laser writing parameters, TPP DLW of 3D LCE nanocomposite microstructures was successfully achieved
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