Abstract
Abstract Pressure sensors in the form of polycrystalline semiconducting films on a stainless steel diaphragm covered with an insulating layer have been fabricated. Phosphorus-doped polycrystalline germanium films are prepared by plasma-assisted chemical vapour deposition (plasma-CVD) and used as the sensing part of these devices. The deposition temperature is between 200 and 400 °C and the PH 3 /GeH 4 ratio is ∼3.6 × 10 −2 . The gauge factor of these films is larger than 30, and is more than twice that of polycrystalline silicon films prepared at 800 °C. The sensitivity of the pressure sensor is more than 1.5 times higher than that of devices using polycrystalline silicon thin films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.