Abstract
We have performed measurements of positive secondary ion emission during low pressure oxidation of aluminum. We found that the enhancement of the ion yield is independent of the pressure at which the exposure is made, in disagreement with what one would expect based on work function models of SIMS. This result partially supports “chemical” ion emission models.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
