Abstract
A few-layer hexagonal boron nitride (h-BN) films with wafer-scale thickness uniformity were grown by using a multiwafer metal–organic chemical vapor deposition (MOCVD) system at relatively low temperature of 1050 °C under various reactor pressures. The effect of the reactor pressure on the structural properties of the h-BN films was systematically investigated by various spectroscopic and microscopic analysis tools including near-edge X-ray absorption fine structure spectroscopy and transmission electron microscopy. We found that the defects in the MOCVD-grown h-BN films such as nitrogen vacancies and grain boundaries were strongly affected by the reactor pressure, which was elucidated by pressure-dependent change of Gibbs free energy for the nuclei formation and reaction rates. Based on our experimental observations, the growth strategies were discussed for realization of high-quality, multiwafer-scale uniformity h-BN films grown by MOCVD at temperature of 1050 °C.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
