Present developments of research MeV Pelletron ion implantation systems

Abstract

National Electrostatics Corp. has manufactured 79 ion beam systems. 17 of these Pelletron systems were designed with MeV ion implantation capability as a primary objective. Of these system, 8 were designed specifically for production ion implantation with a maximum beam energy of 4 MeV. For research applications, ion beam masses from carbon through gold have been accelerated with a maximum observed energy of 38 MeV from a 3 MV tandem S-series Pelletron. This paper will present performance charts which describe the observed ion beam capabilities of existing 3 MV tandem Pelletrons. In addition, the performance of the new high current, four charging chain, S-Series accelerator, currently in manufacture, will be given. A new 4 MV tandem S-Series Pelletron has been proposed, its expected capabilities will be stated. The NEC electrostatics raster scanner which is in use for MeV implantation provides uniform deposition at a maximum scan angle of ± 3.0 ° for 4 MeV doubly charged ions. The output wave form at ±10 kV scanning potential will be shown.