Preparation technology of micro-textured tools fabricated by inductively coupled plasma etching

Abstract

Using inductively coupled plasma etching technology, cemented carbide cutting tools with microtextures were successfully prepared through the pre-treatment, photolithography, film, and etching processes. The results indicated that the ultrasonic cleaning could effectively remove the pollution particles on the tool surface and ensure the cleanliness of the tool surface. Pre- and post-baking processes can enhance the adhesion of the photoresist on the surface of the tool, but the baking time should not be too long or too short, and the baking temperature should be moderate. In the development process, developing time is an important factor affecting the development effect. If the developing time was too long or too short, the experiment would fail, or the subsequent process will be affected. A small amount of residues of photoresist that were not eliminated by the developer can be removed by the plasma residual photoresist removal process. In the film process, one should pay attention to the reasonable choice of the aluminum film thickness and use the correct process sequence. In the etching process, sulfur hexafluoride should be selected as etching gas, and oxygen and argon can be added to improve the etching rate and etching surface quality.