Preparation, photoisomerization, and microfabrication with two‐photon polymerization of crosslinked azo‐polymers

Abstract

ABSTRACTWe report the preparation, photoisomerization properties, and three‐dimensional (3D) microstructure fabrication with two‐photon polymerization of crosslinked azo‐polymers. A series of bi‐acrylate‐substituted azobenzene derivatives were designed and synthesized as the monomers and/or crosslinkers of the crosslinked azo‐polymers. The doping concentration of the derivatives in pre‐polymer resins was significantly increased due to the introduction of bulky tert‐butyl and flexible alkyl chains. The double‐exponential dynamics of trans‐to‐cis photoisomerization of the azo‐polymers indicated the coexistence of different processes for the azobenzene moieties in the polymeric crosslinked networks. The crosslinked azo‐polymers exhibited ideal “on–off” switching performance in the highly reversible trans–cis–trans isomerization cycles. Furthermore, we prepared a photoresist containing the azobenzene derivative for 3D microstructure fabrication based on two‐photon polymerization. A woodpile photonic crystal with a photonic bandgap at telecommunication wavelength region was successfully fabricated with the azobenzene‐containing photoresist, which would open the way for the design and manufacturing of miniature optical communication devices. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 2947–2956, 2013