Abstract
Generally, thin-film metal glass (TFMG) is deposited using two or more elemental targets. Thus, achievement of a homogeneous coating during mass production is difficult. As a new method of TFMG deposition, a single target with high glass-forming ability (GFA) has been used to improve the sputtering process, facilitating easy processing and broad application of sputtering targets. In this study, three kinds of targets (i.e., cast, amorphous, and crystalline targets) are prepared via casting and powder processes. The thermal and mechanical properties of the three targets prepared using the various methods are investigated, and the crystalline target is found to be the most thermodynamically and mechanically stable of the three alternatives. In addition, for TFMG deposited using the microcrystalline target, excellent compositional uniformity between the target and coating is achieved. Therefore, this study experimentally demonstrates that a fine crystalline target is most suitable for use as a multi-component single target in GFA manufacturing methods. These findings are expected to facilitate commercial use of TFMGs.
Highlights
Since its discovery in 1960, metallic glass (MG) has become one of the most studied metal materials [1]
The thin-film metal glass (TFMG) deposited using a fine crystalline target in this study can be regarded as a kind of cluster–assembled metallic glass (CAMG)
We attempted to improve the sputtering process for TFMG deposition by using a
Summary
Since its discovery in 1960, metallic glass (MG) has become one of the most studied metal materials [1]. MG is not industrially used because it is difficult to manufacture To overcome these disadvantages of MG, a new alloy system with high glass-forming ability (GFA) has been developed [4]. Further investigation of the sputtering target for TFMG deposition is still required. When targets produced by arc melting are used, the composition of the deposited film is different from that of the target [22]; this technique may be difficult to apply to fields requiring an exact composition. For TFMG commercialization, the sputtering method should be simple and there should be low compositional difference between the deposited film and target. We investigate the production of a single target with a GFA that can deposit. In this work, GFA single targets are prepared through various manufacturing methods and the most suitable method of target production is experimentally confirmed
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