Abstract
YBCO thin films with critical temperatures above 83 K have been successfully prepared by DC magnetron sputtering. Control of the parameters during the sputtering deposition process is very important for obtaining high-Tc films. The spatial distribution of Y, Ba and Cu deposited on ZrO2 at ambient temperature and at 670 degrees C were investigated by electron beam microprobe analysis. Due to the existence of O anions, there is a re-sputtering phenomenon during the deposition process, so that an abrupt change in composition may be observed in the deposit. The influence of the substrate temperature on the structure and properties of films was studied. The film deposited on the substrate at 670 degrees C with c axis orientation has a critical transition temperature above 78.5 K.
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