Abstract
Vanadium oxide thin films were prepared by the r.f. magnetron sputtering using vanadium metal powder as the target. The results are summarized as follows;(1) The deposition rate depended largely on the deposition parameters, such as sputtering power, gas pressure and oxygen concentration in the Ar-O2 gas atmosphere.(2) The films deposited at room temperature were amorphous. When the substrate temperatures were above 200°C, crystalline films were obtained.(3) With the increase of oxygen concentration in sputtering gas, the composition of thin films was transformed as follows: V→VO2→V4O9→V2O5.
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