Preparation of Transparent Metal Films, Titanium-Doped Zinc-Oxide Films (TiO2)2 (ZnO)98 on PEN by Using a RF-Magnetron Sputtering Method

Abstract

In this work, (TiO2)x (ZnO)100-x (TZO) films were prepared on glass substrate at room temperature by RF-magnetron sputtering. The TZO film with x = 2 wt.% shows a very low resistivity of 4.7 × 10−4 Ω·cm which is comparable to that of ITO films and a high transmittance over 85% in the visible range. In particular, TiO2 (2wt.%)-doped ZnO (TZO) films with thicknesses ranging from 100 ∼ 500 nm were also prepared on Polyethylene naphthalate (PEN) substrates under various RF-powers. Their electrical property were investigated as a function of RF-power. This property was found to be closely related with the crystallization and density of TZO films. It was also noted that vaporization of the water and other adsorbed particles, such as organic solvents contained in most plastic substrate affect the properties of the TCO films.