Preparation of TiN film on the inner surface of a pipe by plasma-based ion implantation and deposition

Abstract

Titanium nitride (TiN) films were prepared on the inner surface of a pipe with a diameter of 80 mm and a length of 150 mm using plasma-based ion implantation and deposition (PBII-D). A titanium cathodic arc discharge was generated at a nitrogen pressure of 8 Pa. Gold-colored TiN films were prepared. The film thickness decreases with increasing the distance from the cathodic arc source due to the spatial distribution of the plasma species. A grounded rod, which is placed in the center of the pipe, does not largely influence the film thickness, but enhances the microhardness of the prepared film. The center rod also makes the PBII-D process stable for applying a pulse voltage.