Abstract
Ti/N and Ag/TiN x multilayers were prepared by plasma based ion implantation (PBII) with multi-targets unbalanced magnetron sputtering and analyzed by Auger electron microscopy (AES) and X-ray photoelectron spectroscopy (XPS). Nitrogen plasma gas and Ti and Ag multi-targets were used in this study. It was found that both gases and metal elements could be implanted into the samples. Ti/N and Ag/TiN x multilayers were successfully fabricated by multi-cycle PBII with nitrogen plasma gas and Ti and Ag unbalanced magnetron sputtering. The possibility of design and fabrication of multilayers by this technique is also discussed. This technique for the deposition of films may find more applications.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
