Preparation of the La 0.8Sr 0.2MnO 3 films on STO and LAO substrates by excimer laser-assisted metal organic deposition using the KrF laser

Abstract

La 0.8Sr 0.2MnO 3 films were prepared on SrTiO 3 (STO) and LaAlO 3 (LAO) substrates using excimer laser-assisted metal organic deposition (ELAMOD). For the LAO substrate, no epitaxial La 0.8Sr 0.2MnO 3 film was obtained by laser irradiation in the fluence range from 60 to 110 mJ/cm 2 with heating at 500 °C. On the other hand, an epitaxial La 0.8Sr 0.2MnO 3 film on the STO substrate was formed by laser irradiation in the fluence range from 60 to 100 mJ/cm 2 with heating at 500 °C. To optimize the electrical properties for an IR sensor, the effects of the laser fluence, the irradiation time and the film thickness on the temperature dependence of the resistance and temperature coefficient of resistance (TCR: defined as 1/ R·(d R/d T)) of the LSMO films were investigated. An LSMO film on the STO substrate that showed the maximum TCR of 3.9% at 265 K was obtained by the ELAMOD process using the KrF laser.