Abstract
Bomb reduction of HfF 4 with Na results in Hf metal sufficiently pure to prepare self-supporting Hf targets of 100–350 μgcm −2 thickness by high vacuum sputter deposition. A necessary condition for the success of the procedure is the capability to convert HfO 2, the standard chemical inventory form of enriched Hf isotopes, into HfF 4, which is free from oxyfluoride admixtures. This is also described in some detail. Targets of the isotopes 176Hf, 177Hf, 178Hf, 179Hf and 180Hf have been prepared by this method.
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