Preparation of Refined SiC Patterns from Imprinting of Partially Cross‐Linked Solid Polycarbosilane

Abstract

Bulky SiC composites with refined patterns were successfully fabricated from an imprinting lithography process using solid polycarbosilane (PCS) as the ceramic precursor. Structures of the master molds were integrally imprinted to PCS pellets by warm‐pressing of nanoimprinter. Total cracking is effectively prevented by precuring of PCS under air condition. The partially cross‐linked PCS exhibits a degree of thermoplasticity, which facilitates embossing of master molds onto the PCS pellets with pattern sizes ranging from 50 μm to 300 nm. The embossed samples were pyrolyzed up to 1300°C for polymer‐conversion and the prepared patterns can be maintained after the precursor transforms to resultant nanocrystalline SiC composite. Meanwhile, this facile imprinting lithography route is supposed to be capable for the synthesis of SiC patterns with nanosized structures.